SUBSTRATE-PROCESSING APPARATUS
申请公布号:JP2011003766(A)
申请号:JP20090146173
申请日期:2009.06.19
申请公布日期:2011.01.06
发明人:NAKANE SHINGO
分类号:H01L21/02;H01L21/027
主分类号:H01L21/02
摘要:PROBLEM TO BE SOLVED: To provide a substrate-processing apparatus for assuring space enough to perform the pulling-out operation of a processing chamber 21 in performing its maintenance, and at the same time disposing a scaffold for the maintenance, in the substrate-processing apparatus 1 equipped with the processing chamber 21 disposed to be stacked in a multi-stage structure.SOLUTION: The scaffold 31 for the operation extending in the pulling-out direction of the processing chamber 21 is disposed inside a frame 3 for the maintenance. Further, a region for the pulling-out operation is assured by disposing the staging point 31 for the operation in a vertically asymmetric manner.