A TRANSISTOR WITH AN EMBEDDED STRAIN INDUCING MATERIAL HAVING A GRADUALLY SHAPED CONFIGURATION

申请公布号：WO2010076017(A1)

申请号：WO2009EP09306

申请日期：2009.12.29

申请公布日期：2010.07.08

申请人：

ADVANCED MICRO DEVICES, INC;KRONHOLZ, STEPHAN;PAPAGEORGIOU, VASSILIOS;BEERNINK, GUNDA;AMD FAB 36 LIMITED LIABILITY COMPANY & CO. KG

发明人：KRONHOLZ, STEPHAN;PAPAGEORGIOU, VASSILIOS;BEERNINK, GUNDA

分类号：H01L21/8234;H01L21/336;H01L21/8238

主分类号：H01L21/8234

摘要：<p>In a transistor a strain-inducing semiconductor alloy, such as silicon/germanium, silicon/carbon and the like, may positioned very close to the channel region by providing gradually shaped cavities which may then be filled with the strain- inducing semiconductor alloy. For this purpose, two or more "disposable" spacer elements of different etch behaviour may be used in order to define different lateral off-sets at different depths of the corresponding cavities. Consequently, enhanced uniformity and thus reduced transistor variability may be accomplished even for sophisticated semiconductor devices.</p>

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