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LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
申请公布号：JP2010068003(A)
申请号：JP20090287652
申请日期：2009.12.18
申请公布日期：2010.03.25
发明人：ZAAL KOEN JACOBUS J M;OTTENS JOOST JEROEN
分类号：H01L21/027
主分类号：H01L21/027
摘要：<P>PROBLEM TO BE SOLVED: To provide a system and the like for improving accuracy for positioning a substrate with respect to a projection system or the like. <P>SOLUTION: A lithographic apparatus with a cover plate formed separately from a substrate table and a means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with a thermal insulation material provided between a cover plate and a substrate table so that the cover plate acts as a thermal shielding material for the substrate table is disclosed. A lithographic apparatus comprising a means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed. <P>COPYRIGHT: (C)2010,JPO&INPIT
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