LIQUID PROCESSING APPARATUS,申请号JP20080191363-传众专利搜索

LIQUID PROCESSING APPARATUS

申请公布号：JP2010028060(A)

申请号：JP20080191363

申请日期：2008.07.24

申请公布日期：2010.02.04

申请人：

TOKYO ELECTRON LTD

发明人：TOJIMA JIRO;NANBA HIROMITSU

分类号：H01L21/304;H01L21/027;H01L21/306

主分类号：H01L21/304

摘要：<P>PROBLEM TO BE SOLVED: To prevent a processing liquid from falling on a body having been processed or from exerting an adverse effect on bodies to be processed next and later even when sticking on a top plate during processing of a body to be processed. Ž<P>SOLUTION: A liquid processing apparatus includes a support section 15 which supports the body W to be processed, a rotary driving section 60 which supports the body W to be processed which is supported by the support section 15, processing liquid supply mechanisms 37 and 39 which supply the processing liquid to the body W to be processed, discharging mechanisms 20 and 21 which discharge the processing liquid having processed the body W to be processed, a rotary cup 10 which guides the processing liquid having processed the body W to be processed to the discharging mechanisms 20 and 21, and the top plate 40 which covers an upper surface side of the body W to be processed. The top plate 40 has a circumferential-edge outward projection portion 40p extending to above the rotary cup 10. The circumferential-edge outward projection portion 40p is provided with sucking mechanisms 70 and 71 for sucking the processing liquid sticking on the circumferential-edge outward projection portion 40p. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž