Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions,申请号US20070789902-传众专利搜索

Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions

申请公布号：US7550254(B2)

申请号：US20070789902

申请日期：2007.04.25

申请公布日期：2009.06.23

申请人：

INTERNATIONAL BUSINESS MACHINES CORPORATION

发明人：SOORIYAKUMARAN RATNAM;ALLEN ROBERT DAVID;FENZEL-ALEXANDER DEBRA

分类号：G03F7/30;G03F7/004;G03F7/075

主分类号：G03F7/30

摘要：Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a wavelength less than 365 nm and are also substantially transparent to deep ultraviolet radiation (DUV), i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in single and bilayer, positive and negative, lithographic photoresist compositions, providing improved sensitivity and resolution. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.