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THIN-FILM FORMING METHOD

申请公布号:JP2009130288(A)

申请号:JP20070306405

申请日期:2007.11.27

申请公布日期:2009.06.11

申请人:
ULVAC JAPAN LTD

发明人:HARADA MASAMICHI;OGAWA YOHEI

分类号:H01L21/3205;C23C14/14;C23C14/34;C23C16/18;C23C16/34;H01L23/52

主分类号:H01L21/3205

摘要:PROBLEM TO BE SOLVED: To provide a thin-film forming method capable of forming a barrier metal film, which has excellent step coverage against holes or a trenches for interconnection, the holes or trenches tending toward finer geometry, while maintaining the barrier property inherently demanded to the barrier metal film, and which can forming a Cu film without generating voids on the barrier metal film surface and with high adhesion therebetween. SOLUTION: The barrier film is constructed by forming a TiN film with an ALD (Atomic Layer Deposition) method, and a film selected from those of Ti, Ru, and Co, or an alloy film including at least two out of those is stacked on the TiN film surface with a CVD method or a PVD method. COPYRIGHT: (C)2009,JPO&INPIT

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