Method for coating of substrate with low viscous liquid, involves positioning film applicator over substrate in such manner that gap of defined width is formed between film applicator and substrate,申请号DE20071029855-传众专利搜索

Method for coating of substrate with low viscous liquid, involves positioning film applicator over substrate in such manner that gap of defined width is formed between film applicator and substrate

申请公布号：DE102007029855(A1)

申请号：DE20071029855

申请日期：2007.06.28

申请公布日期：2009.01.02

申请人：

SIEMENS AG

发明人：GAERDITZ, CHRISTOPH;PAETZOLD, RALPH;SARFERT, WIEBKE;SCHMID, GUENTER;WEGERER, HARALD

分类号：B05D1/26;B05D1/40

主分类号：B05D1/26

摘要：#CMT# #/CMT# The method involves positioning a film applicator (4) over the substrate (1) in such a manner that a gap (5) of defined width is formed between the film applicator and the substrate. The liquid is added to the film applicator in such a manner that liquid is collected in the gap and a wet film (2) of defined layer thickness is formed on the substrate by a relative motion of substrate and film applicator during a film drawing process. #CMT#USE : #/CMT# Method for coating of a substrate with a low viscous liquid. Can also be used for production of organic light emitting diodes (Claimed). #CMT#ADVANTAGE : #/CMT# The liquid is added to the film applicator in such a manner that liquid is collected in the gap and a wet film of defined layer thickness is formed on the substrate by a relative motion of substrate and film applicator during a film drawing process, and hence ensures a method that produces structured layers with smaller waste. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a side view of a substrate. 1 : Substrate 2 : Wet film 3 : Ductor holder 4 : Film applicator 5 : Gap.