VAPOR GROWTH APPARATUS,申请号JP19840252390-传众专利搜索

VAPOR GROWTH APPARATUS

申请公布号：JPS61129823(A)

申请号：JP19840252390

申请日期：1984.11.29

申请公布日期：1986.06.17

申请人：

TOSHIBA MACH CO LTD

发明人：GOTO TAISAN;CHIBA TAKEO;ISHIKAWA TAKETOSHI

分类号：H01L21/205;H01L21/31

主分类号：H01L21/205

摘要：PURPOSE:To heat uniformly a number of substrates, by arraying the substrates between two heating members each having a different transmission factor to radiation irradiated from the exterior of the reaction vessel. CONSTITUTION:Radiation irradiated from lamps 7 passes through the quartz- made reaction vessel 4 and then strikes on a first heating member 9. The heating member 9 which is made of silicon absorbs a portion of the radiation transmitted through the vessel 4 to heat it. The radiation which is transmitted through the heating member 9 strikes on a second heating member 22. The heating member 22 which is made of carbon almost absorbs the radiation transmitted through the heating member 9. By selecting lamps generating radiation with an appropriate wavelength, absorption of the radiation by the vessel 4 can be kept small to heat the heating members 9, 22 to approximately equal temperatures. Thus the substrates 21 placed in a ring shaped space 6a between the heating members 9, 22 can be heated by them.