PECVD PROCESS CHAMBER BACKING PLATE REINFORCEMENT

申请公布号：WO2008106545(A3)

申请号：WO2008US55177

申请日期：2008.02.27

申请公布日期：2008.10.23

申请人：

APPLIED MATERIALS, INC.;WHITE, JOHN, M.;KURITA, SHINICHI;TINER, ROBIN, L.

发明人：WHITE, JOHN, M.;KURITA, SHINICHI;TINER, ROBIN, L.

分类号：C23C16/00

主分类号：C23C16/00

摘要：The present invention generally comprises a backing plate reinforcement apparatus for use in a plasma enhanced chemical vapor deposition apparatus. When processing large area substrates, the backing plate extending across the chamber may also be quite large. By supporting a central area of the backing plate with a frame structure, the backing plate may be maintained substantially planar. Alternatively, as necessary, the contour of the backing plate may be adjusted to suit the particular needs of the process.

FLYING SHEAR

OIL BURNER

BEESWAX CANDLE

MOTOR DRIVEN TOOL HOLDER

RUBBER MANUFACTURE

CASH REGISTER

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