METHOD OF MANUFACTURING CMOS IMAGE SENSOR
申请公布号:US2008160666(A1)
申请号:US20070948808
申请日期:2007.11.30
申请公布日期:2008.07.03
发明人:BANG SUN KYUNG
分类号:H01L31/18
主分类号:H01L31/18
摘要:A method for manufacturing the CMOS image sensor comprising forming an epitaxial layer provided with a plurality of photo diodes on a semiconductor substrate, coating a first photo resist on the epitaxial layer and performing a patterning process on the first photo resist using a predetermined reference value in order to form a first photo resist pattern, coating a second photo resist on the epitaxial layer and first photo resist pattern and performing a patterning process for the second photo resist in order to form the second photo resist pattern on the first photo resist pattern; and forming a well area of a pixel area by performing a dopant implantation process using a mask pattern including the first photo resist pattern and the second photo resist pattern.
CUERPO DE RELLENO HUECO EN FORMA DE BOLA.
CONJUNTO DE AIRE ACONDICIONADO PARA VEHICULOS.
NUEVA PROTEINA DEL LIGANDO DE LA P-SELECTINA.
PROCEDIMIENTO PARA LA SEPARACION DE CLORO DEL GAS PRODUCTO DE UN PROCESO DE OXIDACION DE HCl.
Dispositivo per lavorare bordi a profilo toroidaledi lastre di materiale lapideo.
CONTINUOUS PROCESS FOR THE PREPARATION OF SODIUM TITANATE NANOTUBES
ANTENA PARA MONITORIZACION DEL CAMPO ELECTROMAGNETICO AMBIENTAL EN TIEMPO REAL.
ALMOHADILLA INTER-PECTORAL FEMENINA.
Zubereitung für die nutritive Ergänzung zur Gewichtsreduktion
PROPORTIONAL INTEGRAL DIFFERENTIAL REGULATOR WITH ADDITIONAL REGULATING ACTION
RESEALABLE CLOSURE WITH PACKAGE INTEGRITY FEATURE AND PACKAGE
ROLLER PRESS WITH ANNULAR DISC