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METHOD AND DEVICE FOR CLEANING WAFER, AND MAGNETIC RECORDING MEDIUM OBTAINED BY SAME METHOD

申请公布号:JP2007329412(A)

申请号:JP20060161326

申请日期:2006.06.09

申请公布日期:2007.12.20

申请人:
FUJI ELECTRIC DEVICE TECHNOLOGY CO LTD

发明人:FUKAZAWA NAOTO;SHIROMA TAKAHIRO;ISO AKIYOSHI

分类号:H01L21/304

主分类号:H01L21/304

摘要:PROBLEM TO BE SOLVED: To provide a cleaning a wafer method for by which both superior efficiency percentage and detergency can compatibly be obtained at high levels. SOLUTION: When a wafer is cleaned by using a plurality of roll sponges which are radially disposed, the roll sponges are rotated on their lengthwise axes and also rotated around a radial center axis. COPYRIGHT: (C)2008,JPO&INPIT

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