PATTERN FORMATION METHOD AND PATTERN FORMATION SYSTEM,申请号KR20070044132-传众专利搜索

PATTERN FORMATION METHOD AND PATTERN FORMATION SYSTEM

申请公布号：KR20070058400(A)

申请号：KR20070044132

申请日期：2007.05.07

申请公布日期：2007.06.08

申请人：

SEIKO EPSON CORPORATION

发明人：SAKURADA KAZUAKI;SHINTATE TSUYOSHI;UEHARA NOBORU

分类号：H01L21/027;B41J2/06;B41J3/28;B41J11/00;B41J15/04;H05K1/00;H05K3/00;H05K3/12;H05K3/14;H05K3/24;H05K13/00

主分类号：H01L21/027

摘要：<p>A pattern formation method and system is provided to form a pattern on a reel to reel substrate by using a liquid drop ejection method in which a mass of liquid material is applied by being ejected in the form of liquid drops. A surface of a reel to reel substrate is cleaned(S1), and a lyophilic characteristic or a lyophobic characteristic is imparted to the surface of the reel to reel substrate(S2). A liquid material containing an electrically conductive material is applied onto the reel to reel substrate by a liquid drop ejection method(S3), and the applied liquid material is dried(S4). The liquid material containing an insulating characteristic is applied onto an upper layer of the region upon subjected to the wiring material drying process by the liquid drop ejection method(S5). The liquid material containing insulating characteristic is hardened(S6).</p>