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SYSTEM AND METHOD FOR ABSORBANCE MODULATION LITHOGRAPHY

申请公布号:WO2006088643(A3)

申请号:WO2006US03466

申请日期:2006.01.31

申请公布日期:2007.03.22

申请人:
MASSACHUSETTS INSTITUTE OF TECHNOLOGY;MENON, RAJESH;SMITH, HENRY, I.

发明人:MENON, RAJESH;SMITH, HENRY, I.

分类号:G03F7/09

主分类号:G03F7/09

摘要:A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.

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