ELECTROOPTIC APPARATUS SUBSTRATE AND METHOD OF EXAMINING SUCH A SUBSTRATE, ELECTROOPTIC APPARATUS COMPRISING SUCH A SUBSTRATE AND ELECTRONIC EQUIPMENT COMPRISING SUCH AN APPARATUS,申请号KR20077003090-传众专利搜索

ELECTROOPTIC APPARATUS SUBSTRATE AND METHOD OF EXAMINING SUCH A SUBSTRATE, ELECTROOPTIC APPARATUS COMPRISING SUCH A SUBSTRATE AND ELECTRONIC EQUIPMENT COMPRISING SUCH AN APPARATUS

申请公布号：KR20070029842(A)

申请号：KR20077003090

申请日期：2007.02.08

申请公布日期：2007.03.14

申请人：

SEIKO EPSON CORPORATION

发明人：ISHII TATSUYA;YAMAJI SHIGEFUMI;MIZUGAKI KOICHI

分类号：G02F1/13;G01R31/00;G02F1/133;G09G3/00

主分类号：G02F1/13

摘要：An electrooptic apparatus substrate and examination method therefor can be provided which can implement an examination without requiring bringing a probe into contact thereto from the outside and with satisfactory measuring accuracy. A substrate 1 of the present invention includes a video line 7 and transmission gate portion 6 through multiple switching elements for writing a first potential signal in multiple pixels through a signal line. The substrate 1 further includes a display data reading circuit portion 4 having a differential amplifier 4a for lowering a lower potential and heightening a higher potential and outputting it to the signal line and a transmission gate portion 6 and video line 7 for reading the first potential signal and a reference second potential signal. ® KIPO & WIPO 2007