SPUTTERING TARGET AND THIN FILM FOR OPTICAL INFORMATION RECORDING MEDIUM,申请号WO2006JP305949-传众专利搜索

SPUTTERING TARGET AND THIN FILM FOR OPTICAL INFORMATION RECORDING MEDIUM

申请公布号：WO2006137199(A1)

申请号：WO2006JP305949

申请日期：2006.03.24

申请公布日期：2006.12.28

申请人：

NIPPON MINING & METALS CO., LTD.;TAKAMI, HIDEO;YAHAGI, MASATAKA

发明人：TAKAMI, HIDEO;YAHAGI, MASATAKA

分类号：C23C14/34;C04B35/453;C04B35/547;G11B7/254;G11B7/257;G11B7/26

主分类号：C23C14/34

摘要：<p>A sputtering target which comprises zinc sulfide and an oxide having a trivalent positive element A, for example, indium oxide, zinc oxide or the like as the main components, characterized by the content of sulfur amounting to from 5 to 30% by weight of the all components, having both of the (111) peak intensity I1 of the cubic system ZnS and the (100) peak intensity I2 of the hexagonal system Zns in the XRD measurement, and fulfilling I1>I2. Namely, it is intended to provide a sputtering target having a high intensity whereby the target can be prevented from cracking in the course of producing the target or forming a film by sputtering, a method of producing the same, a thin film for an optical information recording medium which is most suitably usable as, in particular, a protective film, and a method of producing the same.</p>