Charged particle beam apparatus

申请公布号：US2006289753(A1)

申请号：US20060437638

申请日期：2006.05.22

申请公布日期：2006.12.28

申请人：

HITACHI, LTD.

发明人：ONISHI TAKASHI

分类号：G21K7/00;H01J37/16;G01N23/225;H01J37/09;H01J37/244;H01J37/304;H01J37/305;H01L21/027

主分类号：G21K7/00

摘要：The charged particle beams is provided, which can analyze contamination of the inner wall of the system without being disassembled and supply information on appropriate maintenance timing. The contamination level of the inner wall of the system is identified by measuring the spectrum of the X-rays emitted from the inner wall due to irradiation of a charged particle beam or a recoil electron.

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