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Positive resist composition and pattern-forming method using the same
申请公布号：US2006199100(A1)
申请号：US20060366420
申请日期：2006.03.03
申请公布日期：2006.09.07
发明人：KANDA HIROMI
分类号：G03C1/76
主分类号：G03C1/76
摘要：A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same.