Process of manufacturing coil layers using a novel combination of photoexposure and thermal curing to achieve shape control of a photoresist material

申请公布号：US7089651(B2)

申请号：US20010971277

申请日期：2001.10.05

申请公布日期：2006.08.15

申请人：

HEADWAY TECHNOLOGIES, INC.

发明人：ZHENG YI;LIU YI-CHUN

分类号：G11B5/17;G03F7/00;G11B5/31

主分类号：G11B5/17

摘要：A method for forming at least two layers of electrical coils and their supportive resistive layers for a magnetic write head having an ultra-short yoke so that the second and any additional coil layers are formed on flat resistive surfaces to eliminate problems associated with inter- and intra-layer shorting and with shorting between coil and yoke. The resistive layers are formed with flat surfaces and desired apex angles by using a novel two-step photoresist scheme in which a layer of photoresist is first photoexposed and developed, then photoexposed a second time to cure a surface region that will remain flat during a final low temperature curing process.

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