EXPOSURE MASK FOR CRYSTAL RESONATOR,申请号JP20040253654-传众专利搜索

EXPOSURE MASK FOR CRYSTAL RESONATOR

申请公布号：JP2006074297(A)

申请号：JP20040253654

申请日期：2004.08.31

申请公布日期：2006.03.16

申请人：

KYOCERA KINSEKI CORP

发明人：GOTO MASAHIKO

分类号：H03H3/02;G03F1/42

主分类号：H03H3/02

摘要：PROBLEM TO BE SOLVED: To provide an exposure mask which can be used for the crystal plate of a rotation Y plate of plural kinds of thicknesses even if the mask is a single sheet. SOLUTION: The exposure mask is used for deciding an etching process region of etching process of a crystal resonator, which is performed by applying protective films on top and bottom surfaces of the rotation Y plate acquired by rotating a Y plate byθ°(degree of theta) around an X axis. In this exposure mask, a receiver side alignment mark on the exposure mark is a grid-like pattern, the widths of a plurality of adjacent grids of the grid-like pattern have regular intervals, and the widths of a plurality of adjacent grids of the grid-like pattern are each t/tanθof the thickness of the crystal substrate of the rotation Y plate to be exposed. COPYRIGHT: (C)2006,JPO&NCIPI