LINE HEAD, ITS MANUFACTURING METHOD, AND IMAGE FORMING APPARATUS,申请号JP20040229024-传众专利搜索

LINE HEAD, ITS MANUFACTURING METHOD, AND IMAGE FORMING APPARATUS

申请公布号：JP2006044088(A)

申请号：JP20040229024

申请日期：2004.08.05

申请公布日期：2006.02.16

申请人：

SEIKO EPSON CORP

发明人：KOBAYASHI HIDEKAZU

分类号：B41J2/44;B41J2/45;B41J2/455;H01L51/50

主分类号：B41J2/44

摘要：PROBLEM TO BE SOLVED: To provide a technique for negating periodic variation in quantity of light of an SL array, and at the same time to provide an image forming apparatus equipped with a line head. SOLUTION: The line head 1 exposes a part to be exposed to light by shedding light on the part via a lens array comprised of arranged lens elements. A plurality of EL elements 3 which have functional layers for emitting the light and eject the light from the functional layers towards the lens array are arranged on a substrate 2, whereby a light emitting element array 3A is formed. For correcting variation in quantity of light of the lens array, the light emitting element array 3A changes an emission area 25a of each EL element 3 so that the emission area 25a of the functional layer becomes large for the EL element 3 corresponding to a part where the quantity of light guided by the lens array is small, and so that the emission area 25a of the functional layer becomes small for the El element 3 corresponding to a part where the quantity of light guided by the lens array is large. COPYRIGHT: (C)2006,JPO&NCIPI