Alignment method using ion beam irradiation

申请公布号：US2005259204(A1)

申请号：US20050134279

申请日期：2005.05.23

申请公布日期：2005.11.24

申请人：

LG.PHILIPS LCD CO., LTD.

发明人：HAM YONG S.

分类号：G02F1/1337;(IPC1-7):G02F1/133

主分类号：G02F1/1337

摘要：Provided is an alignment method including: forming an alignment film on a substrate; irradiating an ion beam onto the alignment film using a bar-type ion gun; and cleaning a surface of the substrate having the alignment film. The irradiating of an ion beam satisfies the following equation: 1.6x10<SUP>-4</SUP><=(LgxIxT)/Ls<=1.6x10<SUP>-2</SUP>, where I is an ion beam current (A) measured outside an ion beam outlet and irradiated from the bar-type ion gun, Lg is a length (cm) of the ion beam outlet with respect to a moving direction of the substrate, Ls is a length (cm) of the substrate in the moving direction of the substrate, and T is a process time (sec) for processing one substrate.

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