State of the art constant flow device,申请号US20020278104-传众专利搜索

State of the art constant flow device

申请公布号：US6872262(B2)

申请号：US20020278104

申请日期：2002.10.22

申请公布日期：2005.03.29

申请人：

CHARTERED SEMICONDUCTOR MANUFACTURING LTD.

发明人：CHONG KAM BENG;KHEE CHIN CHOON;HENG CHUA KIEN;CHENG TEH GUAT

分类号：B24B57/02;B08B3/04;G05D7/06;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):B08B7/04

主分类号：B24B57/02

摘要：A new method and apparatus is provided that assures constant fluid flow of the fluid that is entered into a semiconductor device processing tank or container. A flow meter is set to a particular flow rate; the fluid that comes from the POU is routed through the flow meter. The fluid passes through a flow meter into a processing tank. The fluid is allowed to fill the container up to an overflow point of the container. An overflow basin is provided into which the overflowing fluid is routed from where the fluid is drained into a fluid reclaim vessel. The overflow is detected by a sensor, the sensor activates an overflow relieve valve that is mounted in the bottom of the container. The overflow relieve valve is opened and drains fluid from the container thus counteracting the overflow of the fluid into the overflow basin. The interaction between the overflow detector and the overflow relieve valve assures a constant rate of supply of the fluid to the processing tank or container.