METHOD OF MANUFACTURING A SOLAR CELL
申请公布号:WO2004023567(A3)
申请号:WO2003JP11203
申请日期:2003.09.02
申请公布日期:2005.01.13
发明人:MISHIMA, TAKAHIRO;ISHIKAWA, NAOKI;EMOTO, MAKIKO
分类号:H01L31/04;H01L21/306;H01L31/0236;H01L31/18
主分类号:H01L31/04
摘要:A porous film having a resistance to etching is formed on a semiconductor substrate for a solar cell by using a paste. The semiconductor substrate having the porous film, which serves as a mask, is etched so as to form an antireflection structure having fine irregularities on the semiconductor substrate. The paste should preferably contain particles having an alkali resistance or an acid resistance.