Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom,申请号US20040818548-传众专利搜索

Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom

申请公布号：US2004194817(A1)

申请号：US20040818548

申请日期：2004.04.05

申请公布日期：2004.10.07

申请人：

POPE KEITH;MOUNT DAVID J.;ROTHMAN LAURA;WHITE RICK C.;BUSBY CLIFTON;DOUGLAS STEPHEN B.;DOW RAYMOND J.

发明人：POPE KEITH;MOUNT DAVID J.;ROTHMAN LAURA;WHITE RICK C.;BUSBY CLIFTON;DOUGLAS STEPHEN B.;DOW RAYMOND J.

分类号：B08B7/00;H01L21/00;(IPC1-7):B08B3/02

主分类号：B08B7/00

摘要：A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.