APPARATUS FOR FABRICATING SEMICONDUCTOR,申请号KR20030002997-传众专利搜索

APPARATUS FOR FABRICATING SEMICONDUCTOR

申请公布号：KR20040065814(A)

申请号：KR20030002997

申请日期：2003.01.16

申请公布日期：2004.07.23

申请人：

SAMSUNG ELECTRONICS CO., LTD.

发明人：KIM, SANG U;KWAK, SE GEUN;SEO, MUN MIN

分类号：H01L21/68;(IPC1-7):H01L21/68

主分类号：H01L21/68

摘要：PURPOSE: An apparatus for fabricating a semiconductor is provided to heat uniformly a wafer and lengthen a lifetime of a heater by improving a structure of a heater unit. CONSTITUTION: An apparatus for fabricating a semiconductor includes a process chamber, a susceptor, and a heater part. The susceptor is installed in the inside of the process chamber. A semiconductor substrate is loaded on the susceptor. The heater part is installed within the susceptor. The heater part includes an internal heater(320) for heating a center part of the semiconductor substrate and an external heater(330) for heating an edge part of the semiconductor substrate. The external heater includes a first part(342), a second part(344) for covering the first part, and a third part(346) for covering the second part.