INDUCTIVE ELEMENT AND ITS MANUFACTURING METHOD,申请号JP20020285824-传众专利搜索

INDUCTIVE ELEMENT AND ITS MANUFACTURING METHOD

申请公布号：JP2004127976(A)

申请号：JP20020285824

申请日期：2002.09.30

申请公布日期：2004.04.22

申请人：

TDK CORP

发明人：SATO SHINICHI;KIKUCHI TOSHIAKI;OKUBO HITOSHI

分类号：H01F41/04;H01F5/00;H01F17/00;H01F17/02;(IPC1-7):H01F17/02

主分类号：H01F41/04

摘要：PROBLEM TO BE SOLVED: To provide an inductive element which is easily mass-produced, equipped with a conductor pattern that hardly gets out of position, displays an inductance value of narrow tolerance, and has a high Q characteristics, and to provide its manufacturing method. SOLUTION: Conductor layers 2A and insulating layers 4A are alternately laminated into a raw material 17. A plurality of grooves 18, which are each as wide as prescribed so as to form the inner circumference of a coil, is cut in the surface of the raw material 17 as they are arranged in parallel with each other in the direction of lamination. An embedding material 5 is embedded in each of the grooves 18. The surface of the raw material 17 where the embedding materials 5 are embedded is set in good order by grinding. The adjacent conductor layers 2A are connected to constitute a helical coil serving as the inductive element. The both sides of the raw material 17 are covered with an insulating layer, and the material 17 is cut into separate chips. COPYRIGHT: (C)2004,JPO