APPARATUS FOR CLEANING WAFER,申请号KR20010066895-传众专利搜索

APPARATUS FOR CLEANING WAFER

申请公布号：KR20030035035(A)

申请号：KR20010066895

申请日期：2001.10.29

申请公布日期：2003.05.09

申请人：

SAMSUNG ELECTRONICS CO., LTD.

发明人：NAM, CHANG HYEON

分类号：H01L21/304;B08B3/12;H01L21/00;(IPC1-7):H01L21/304

主分类号：H01L21/304

摘要：PURPOSE: An apparatus for cleaning a wafer is provided to protect the wafer from contaminant by selectively performing a spin dry process or an isopropyl alcohol(IPA) reduced pressure dry process according to a pattern condition of the wafer. CONSTITUTION: A plurality of cleaning solution supply units supply a cleaning solution to a chemical bath(11) having a wafer mounting unit on which the wafer is mounted. A plurality of exhausting units(26) selectively exhaust the chemical solution supplied by the cleaning solution supply unit after a cleaning process. The wafer mounting unit in side the chemical bath is capable of rotating. An IPA vapor supply unit(30) is additionally installed in a side of the chemical bath so that either one of a spin dry process or an IPA reduced pressure dry process is selectively performed according to the pattern condition of the wafer.