Device for exposure of a peripheral area of a wafer,申请号US20020243911-传众专利搜索

Device for exposure of a peripheral area of a wafer

申请公布号：US2003053039(A1)

申请号：US20020243911

申请日期：2002.09.16

申请公布日期：2003.03.20

申请人：

USHIODENKI KABUSHIKI KAISHA

发明人：NAGAI YOSHINORI;TOCHIHARA KAZUMOTO

分类号：G03F7/20;H01L21/027;H01L21/68;(IPC1-7):G03B27/42

主分类号：G03F7/20

摘要：A device for exposing a peripheral area of a wafer, in which the area which is located within the wafer (and which need not be exposed) is prevented from being exposed regardless of the orientation the wafer which bears a notch in its periphery. The device includes an exposure light irradiation part, a wafer edge determination part, and a notch determination part are arranged integrally with each other. The wafer edge determination part moves such that it follows the edge of the wafer. The peripheral area of the edge of the wafer is exposed by exposure light emitted by the exposure light irradiation part. When the exposure sequence begins irradiation with exposure light is not immediately done, even if the means for wafer edge determination has determined the wafer edge. Instead, the wafer is rotated by a given amount and then exposure is begun. When the area irradiated with exposure light reaches the notch starting position, wafer edge determination is stopped until the end position of the notch is reached.