METHOD TO DETECT SURFACE METAL CONTAMINATION
申请公布号:WO2002029883(A1)
申请号:GB2001004454
申请日期:2001.10.05
申请公布日期:2002.04.11
摘要:<p>A method for detecting surface or near surface metal contamination in a semiconductor or silicon structure is described in which the structure or a part thereof is exposed to an excitation beam of predetermined wavelength and collecting luminescence from the structure in as the form of PL map having a substantially uniform PL intensity level provided by the semiconductor; and inspecting the map for one or more regions of enhanced PL intensity identifying characteristic surface or near surface metal contamination. In particular, the method is applied as an in-process quality control or as a quality control of processed structures such as interconnects.</p>
MEHRSCHICHTIGE, GEDRUCKTE LEITERPLATTE UND VERFAHREN ZU IHRER AUSLEGUNG
RUDDER POSITION DIGITAL INDICATOR
FUEL INJECTION DEVICE FOR INTERNAL COMBUSTION ENGINE
SPORTS AND GAME INSTALLATION COMPRISING A RIDABLE RAMP
BALL RETRIEVING AND STORAGE DEVICE
PIPERAZINE DERIVATIVES AND PHARMACEUTICAL COMPOSITIONS
INSULATED BUSBARS IN CONTROL CENTRE
PRODUCTION OF A FIBROUS HIGH-PROTEIN FOOD FROM MILK
VACUUM PACKAGING AND PRESERVING POULTRY
FORMING PRIMARY BACKING FOR TUFTED CARPETS WEB BONDED TO SUBSTRATE
PRODUCTION OF FIBROUS HIGH-PROTEIN FOOD FROM MILK
EAR TAG APPLICATOR RETRACTING PIN