METHOD OF CLEANING ELECTRONIC DEVICE
申请公布号:WO2002029857(A1)
申请号:EP2001011391
申请日期:2001.10.01
申请公布日期:2002.04.11
摘要:<p>A method of manufacturing an electronic device, in particular but not exclusively a semiconductor device, in which method a substrate (2) is placed inside a process chamber (1) and a surface (3) of the substrate (2) is subjected to a cleaning process sequence comprises the steps of: subjecting the surface (3) of the substrate (2) to a wet cleaning treatment, purging the process chamber (1) with an inert gas while keeping the surface (3) of the substrate (2) wet, drying the surface (3) of the substrate (2).</p>