ARC-TYPE ION PLATING APPARATUS,申请号JP20000067936-传众专利搜索

ARC-TYPE ION PLATING APPARATUS

申请公布号：JP2001254171(A)

申请号：JP20000067936

申请日期：2000.03.13

申请公布日期：2001.09.18

申请人：

NISSIN ELECTRIC CO LTD

发明人：OKAZAKI NAOTO;IRISAWA KAZUHIKO

分类号：C23C14/32;(IPC1-7):C23C14/32

主分类号：C23C14/32

摘要：PROBLEM TO BE SOLVED: To provide an arc-type ion plating apparatus which can suppress the temperature rise of a base material, and need not increase the size of a film deposition chamber different from the care of the reciprocal straight motion of a base material holder. SOLUTION: This arc-type ion plating apparatus comprises a carry-in chamber 4, a preliminary heating chamber 6, the film deposition chamber 8 and a carry-out chamber 10 which are arranged in series with vacuum valves 15-17 interposed therebetween. It further comprises a truck 30 to rotatably hold the columnar base material holder 34 which can hold a plurality of base materials 36 on a side surface thereof, a truck carrying mechanism 28 to carry the truck 30 via individual chambers as shown by an arrow A, a holder rotating mechanism 56 to rotate the base material holder 34 in the film deposition chamber 8 by an arrow B, and at least one arc-type evaporation source 60 installed on a side wall of the film deposition chamber 8 so as to be directed to the side surface of the base material holder 34 on the truck 30.