Method of preventing current leakage around a shallow trench isolation structure

申请公布号：US6281081(B1)

申请号：US19980192042

申请日期：1998.11.13

申请公布日期：2001.08.28

申请人：

UNITED MICROELECTRONICS CORP.

发明人：CHIEN SUN-CHIEH;KUO CHIEN-LI;LEE TZUNG-HAN;LIAO WEI-WU

分类号：H01L21/762;(IPC1-7):H01L21/336;H01L21/76

主分类号：H01L21/762

摘要：An ion implantation method useful for fabricating shallow trench isolation structureimplants phosphorus ions instead of arsenic ions into a substrate when the source/drain regions of an NMOS device are doped. Alternatively, low energy ions are used in the ion implantation for forming the source/drain regions of an NMOS device. Consequently lattice dislocations of the crystal structure within a substrate is reduced and unwanted device leakage current is eliminated.

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