FILM FORMING DEVICE,申请号WO2000JP05409-传众专利搜索

FILM FORMING DEVICE

申请公布号：WO0112875(A1)

申请号：WO2000JP05409

申请日期：2000.08.11

申请公布日期：2001.02.22

申请人：

TOKYO ELECTRON LIMITED;YAMASAKI, HIDEAKI;MOCHIZUKI, TAKASHI;ARIMA, SUSUMU;KAWANO, YUMIKO

发明人：YAMASAKI, HIDEAKI;MOCHIZUKI, TAKASHI;ARIMA, SUSUMU;KAWANO, YUMIKO

分类号：H01L21/302;C23C16/18;C23C16/44;C23C16/455;C23C16/458;H01L21/205;H01L21/285;H01L21/3065;H01L21/31;H01L21/687;(IPC1-7):C23C16/18

主分类号：H01L21/302

摘要：A film forming device which comprises an evacuatable treating vessel, a mount disposed in the treating vessel and adapted to have a treatment-object material placed thereon, a treating gas feeding means for feeding a treating gas into the treating vessel, and a heating means for heating the treatment-object material placed on the mount. The lateral and lower sides of the mount are surrounded by a partition wall. The region associated with the mount surrounded by the partition wall has an inert gas introduced thereinto by an inert gas feeding means. A clearance defining member is so disposed that its inner peripheral side defines a clearance above the peripheral edge of the treatment-object material placed on the mount and its outer peripheral side defines a clearance above the partition wall.