TRANSPARENT WINDOW OF PROCESS CHAMBER OF PROCESS APPARATUS, AND METHOD OF MANUFACTURE THEREOF

申请公布号：WO2000074123(P1)

申请号：JP2000003359

申请日期：2000.05.25

申请公布日期：2000.12.07

摘要：<p>A transparent window (30) is provided for a process apparatus including a process chamber (4) evacuated to process a semiconductor wafer (W). The window (30) includes a transparent plate (34) whose surface is coated with protective film (36) consisting of 1.0 νm or thinner crystalline alumina (Al2O3) deposited at a temperature below 350°C. The transparent window thus has protective film (36) with strong adhesion, which is unlikely to undergo cracking or separation.</p>

Antriebsvorrichtung, insbesondere fuer Breitfaerbemaschinen mit umsteuerbarem Geweberuecklauf

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