Magnetron sputter ion plating system
申请公布号:GB0005411(D0)
申请号:GB20000005411
申请日期:2000.03.08
申请公布日期:2000.04.26
分类号:C23C14/35;H01J37/32;H01J37/34
主分类号:C23C14/35
DEVICE FOR DEPOSITING AND FORMING ARTIFICIAL DIAMOND
DETECTION OF ADHERED WATER DROP ETCETERA
MAGNETOOPTIC REPRODUCING DEVICE IN COMMON USE FOR RECORDING
RECORDING AND REPRODUCING DEVICE
IMMUNOMETRISK BESTEMMELSE RETTET MOD FLERE STEDER
FOERFARANDE FOER MODIFIERING AV SMAK.
AGENT FOR KEEPING FRESHNESS OF VEGETABLES AND FRUITS AND SHEET THEREFOR
JUNCTION TYPE SEMICONDUCTOR LIGHT EMITTING ELEMENT
ALKYL-SUBSTITUTED 14-CROWN-4-DERIVATIVE AND ITS USE
DATA DISC SYSTEM FOR COMPUTER X-RAY TOMOGRAPHIC APPARATUS
OPERATION CONTROLLER OF BRUSHLESS MOTOR
METHOD AND DEVICE FOR PRODUCTION OF MATERIAL FOR ELECTROPHORETIC ANALYSIS