FINE WORKING DEVICE, FINE WORKING METHOD AND MANUFACTURE OF FINE WORKING DEVICE

申请公布号：JP2000090872(A)

申请号：JP19980261289

申请日期：1998.09.16

申请公布日期：2000.03.31

申请人：

SEIKO EPSON CORP

发明人：KATSUYAMA TAKANOBU;ISHIDA MASAYA;IDE TSUGIO

分类号：H01J37/28;B62D57/00;B82B3/00;G01N37/00;G01Q60/24;G01Q80/00;H01J37/30;(IPC1-7):H01J37/30;G01N13/16

主分类号：H01J37/28

摘要：PROBLEM TO BE SOLVED: To provide a fine working device capable of stably forming a large area at a high speed. SOLUTION: This device is constituted so as to work a surface to be worked S by bringing a tip of a needle into contact with the surface S to be worked or arranging the tip closely to the surface S. In this case, this probe 20 for working for fine working is provided with a linear contact working pin 201 constituted so that the pin 201 can linearly contact with the surface to be worked. By controlling an angle formed by a contact line and a moving direction, a large area can be worked in a short time as compared with a point contact type probe.

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