ROTARY JOINT DEVICE
申请公布号:JPH11336970(A)
申请号:JP19980139900
申请日期:1998.05.21
申请公布日期:1999.12.07
发明人:YAMAZOE YUTAKA
分类号:F16L27/093;(IPC1-7):F16L27/093
主分类号:F16L27/093
摘要:<p>PROBLEM TO BE SOLVED: To provide a rotary joint device for CMP(chemomechanical polishing) capable of ensuring pressure resistance and durability and capable of miniaturization. SOLUTION: A space between a housing 2 and a rotary unit 3 is sealed by a double mechanical seal 4. A slide surface 41a is formed in both end surfaces of one rotary seal rig 41, this rotary seal ring 41 is sandwiched between a pair of stationary seal rings 42. Each stationary seal ring 42 is press energized from behind by a spring 43. A flow path leading to a rotational side fluid supply path 16 through a first fluid passage L1 from a stationary side fluid flow path 18 and a flow path leading to a stationary side fluid collecting path 19 through a second fluid passage L2 from a rotational side fluid collecting path 17 are partitioned by a seal 6 in a closed space S.</p>