Semiconductor device having monitor pattern formed therein,申请号US19970895044-传众专利搜索

Semiconductor device having monitor pattern formed therein

申请公布号：US5903011(A)

申请号：US19970895044

申请日期：1997.07.16

申请公布日期：1999.05.11

申请人：

KABUSHIKI KAISHA TOSHIBA

发明人：HATANAKA, KAZUHISA

分类号：H01L21/66;H01L23/544;(IPC1-7):H01L23/58

主分类号：H01L21/66

摘要：An object of this invention is to provide a semiconductor device having a monitor pattern which can more strictly ensure the precise finish dimension of a semiconductor integrated circuit device. According to this invention, in a semiconductor device in which a first monitor pattern for monitoring a variation in the dimension of the pattern of the semiconductor integrated circuit device is formed on a semiconductor substrate, the first monitor pattern includes a first SDG region pattern formed on the semiconductor substrate a second SDG region pattern formed on the semiconductor substrate, at least one first gate wiring pattern formed on the first and second SDG region patterns a third SDG region pattern having an area different from the area of the first SDG region pattern and formed on the semiconductor substrate a fourth SDG region pattern having an area different from the area of the first SDG region pattern and formed on the semiconductor substrate and at least one second gate wiring pattern formed on the third and fourth SDG region patterns.