Plasmaadressierte elektrooptische Vorrichtung,申请号DE1993619172T-传众专利搜索

Plasmaadressierte elektrooptische Vorrichtung

申请公布号：DE69319172(T2)

申请号：DE1993619172T

申请日期：1993.04.15

申请公布日期：1999.02.11

申请人：

SONY CORP., TOKIO/TOKYO, JP

发明人：MIYAZAKI, SHIGEKI, C/O SONY CORPORATION, SHINAGAWA-KU, TOKYO, JP

分类号：G02F1/1333;G02F1/133;G09F9/35;H01J17/49;(IPC1-7):G02F1/133

主分类号：G02F1/1333

摘要：A plasma addressing electro-optical device including a first substrate (4)having a major surface: a plurality of first electrodes (5) formed on the major surface of the first substrate (4) so as to extend in substantially parallel relationship to each other; a second substrate (7) having a major surface opposed to the major surface of the first substrate (4); a plurality of second electrodes (A, K) formed on the major surface of the second substrate so as to extend in substantially parallel relationship to each other to generate plasma addressing between adjacent ones of the second electrodes; an electro-optical material layer (6) formed between the first substrate (4) and the second substrate (7); and a plasma discharge chamber (9) formed between the electro-optical material layer (6) and the second substrate (7) so as to seal an ionizable gas therein. The plasma discharge chamber (9) has a height (h) of about 75 % or more of a distance (d) between the adjacent ones of the second electrodes (K, A). According to the setting of the height (h) of the plasma discharge chamber (9) in relation to the distance between the adjacent second electrodes (A, K), stable and uniform plasma discharge in the plasma discharge chamber (9) can be realized. <IMAGE>