METHOD FOR FORMING COLORED RESIST PATTERN AND MANUFACTURE OF COLOR FILTER,申请号JP19970055517-传众专利搜索

METHOD FOR FORMING COLORED RESIST PATTERN AND MANUFACTURE OF COLOR FILTER

申请公布号：JPH10239856(A)

申请号：JP19970055517

申请日期：1997.02.24

申请公布日期：1998.09.11

申请人：

MITSUBISHI CHEM CORP

发明人：GOMI YOSHIYUKI

分类号：G03F7/004;G02B5/20;G02F1/1335;G03F7/20;G03F7/26

主分类号：G03F7/004

摘要：PROBLEM TO BE SOLVED: To provide the method for forming the colored resist pattern having a trapezoidal sectional profile without using any special pattern mask as essentially necessary one and to provide the method for manufacturing the color filter by using this method. SOLUTION: The color filter is manufactured by coating a transparent substrate with a photopolymerizable composition with a black material dispersed, heat drying it, and then, followed by successive processings of imagewise exposure, development, and heat hardening, to form a black matrix, and then, coating the surface of this black matrix with each photopolymerizable composition with red, green, and blue materials dispersed, and likewise successively repeating heat drying, imagewise exposure, development, water rinse, and heat hardening operations to form each image element. In this case, the above-mentioned imagewise exposures of each image are executed in >=2 times by different alignment gaps.