Method of fabricating complementary poly emitter transistors

申请公布号：US5496744(A)

申请号：US19940338691

申请日期：1994.11.14

申请公布日期：1996.03.05

申请人：

KABUSHIKI KAISHA TOSHIBA

发明人：ISHIMARU, KAZUNARI

分类号：H01L29/73;H01L21/225;H01L21/331;H01L21/8238;H01L29/732;(IPC1-7):H01L21/265

主分类号：H01L29/73

摘要：In a method of manufacturing a bipolar transistor by forming emitter regions of PNP and NPN transistors with diffusion of impurity from the polycrystalline silicon film into the substrate, the B-doped polycrystalline silicon film is deposited on the interlayer insulating film in which the emitter holes of the PNP and NPN transistors are made. Further, the interlayer insulating film is deposited on this film, and the portion of the insulating film which situated on the NPN transistor region is removed. Then, the thermal treatment is carried out in a high-concentration P atmosphere, so as to change the portion of the film which is located on the NPN transistor region to a P-doped polycrystalline silicon film. With this thermal treatment, the P-type and N-type emitter diffusion regions are formed on the base regions of the PNP and NPN transistors. According to the manufacturing method, the emitter regions have a uniform impurity concentration in an appropriate shape, thus reducing the variation and degradation of the characteristics of the device due to downsizing.

SFERE DI SICUREZZA PER PNEUMATICI.

MACCHINA PER IL RIEMPIMENTO IN CONTINUO DI CONTENITORI CON PRODOTTI LIQUIDI

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