Methods and systems for shielding in sputtering chambers
申请公布号:US5482612(A)
申请号:US19940286586
申请日期:1994.08.05
申请公布日期:1996.01.09
发明人:ARMSTRONG, FRANK O.;JEFFREYS, BRIAN B.
分类号:C23C14/56;H01J37/34;(IPC1-7):C23C14/34
主分类号:C23C14/56
摘要:An improved metal film deposition system is disclosed which comprises an improved shield (80) to prevent particulate contamination of processed wafers. The shield (80) includes an interstitial layer of flame-sprayed metal which adheres well to both the material comprising the metal film and the metal comprising the shield (80). Further, the shield utilizes radiused deflections (84) and (86) to disperse the forces created by the crystalline growth of the metal film.
ACTIVATED SLUDGE SEWAGE TREATMENT PROCESS
WERKWIJZE VOOR HET ONTWATEREN VAN SLIB EN DROOGVELD VOOR HET TOEPASSEN VAN DE WERKWIJZE
HJAELPMETALLHALTIG SINTERHAORDMETALL-LEGERING OCH FOERFARANDE FOER DESS FRAMSTAELLNING
NOVEL CYCLOSPORIN DERIVATIVES, THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM
SPOSOB ZAPOBIEGANIA SPIEKANIU SIE STALYCH CZASTEK WEGLA W ZLOZU FLUIDALNYM
REAKTOR DO ZGAZOWYWANIA PALIW STALYCH,ZWLASZCZA WEGLA POD ZWIEKSZONYM CISNIENIEM
FLUORINATED ION EXCHANGE POLYMERS CONTAINING CARBOXYLIC GROUPS AND THEIR PRODUCTION
RECOMBINANT DNA TRANSFER VECTOR AND MICROOGRANISM CONTAINIG A GENE FROM A HIGHER ORGANISM
DISCCBRAKE USED PAD KEEP SPRING