DETECTOR FOR PATTERN DEFECT,申请号JP19930295606-传众专利搜索

DETECTOR FOR PATTERN DEFECT

申请公布号：JPH07147309(A)

申请号：JP19930295606

申请日期：1993.11.25

申请公布日期：1995.06.06

申请人：

NIKON CORP

发明人：OKITA SHINICHI

分类号：G01B11/24;G06T1/00;G06T7/00;H01L21/66;H05K3/00

主分类号：G01B11/24

摘要：PURPOSE:To provide a detector for pattern defects, in which the deviation of object pattern data from reference pattern data is first corrected to be within one pixel, and then the error is evaluated to detect defects in the object pattern. CONSTITUTION:A detector for pattern defects comprises an output device 1 for reference multiple-value data, an imaging device 2, a delay circuit 3, an integer-pixel interpolator 4, an auxiliary pixel interpolator 5, an error detector 6, a comparator 7, and a storage 8. The integer-pixel interpolator 4 corrects the deviation of pattern data under test from reference pattern data if it is greater than one pixel, and then the auxiliary pixel interpolator 5 corrects a difference that is smaller than one pixel. The resultant data are input to the error detector 6. Depending on the output from the detector, the comparator 7 judges the pattern data to be defective or not, and the results are stored in the storage 8. It is thus possible to detect minute defects within one pixel.