METHOD FOR OPTIMIZING MASK USING GENETIC ALGORITHM FOR PATTERN RECOGNITION,申请号JP19930285527-传众专利搜索

METHOD FOR OPTIMIZING MASK USING GENETIC ALGORITHM FOR PATTERN RECOGNITION

申请公布号：JPH07121719(A)

申请号：JP19930285527

申请日期：1993.10.21

申请公布日期：1995.05.12

申请人：

GLORY LTD

发明人：TAKEDA FUMIAKI;ONAMI SAIZOU;MONNO TAKASHI

分类号：G07D7/00;G06F15/18;G06N3/00;G06T1/00;G06T7/00;G07D7/12;G07D7/20

主分类号：G07D7/00

摘要：PURPOSE:To decide a mask optimum for identifying paper sheets by simulating three big features of crossing-over, selection and mutation in the mechanism of the evolution process of organisms with a computer when performing the pattern recognition of paper sheets. CONSTITUTION:The read signal of a line sensor 11 is time sequentially inputted to a data processing part 140, processed according to the input of a sample pulse SP, and stored in a memory 141 as a frame image. Only the part of a paper money is segmented from the stored data in the memory 141 by a paper money segmentation part 142 and the segmented image is inputted to a neuro circuit 150, and the identified result DR of the neuro circuit 150 is inputted to an identifying device control part 160 composed of a CPU, ROM and ROM, etc. In this case, since the neuro circuit 150 adopts the conceptions of crossing- over, selection and mutation in genetic engineering for providing the optimum mask pattern, the best mask pattern can be provided in a short time just like the organism takes the process of evolution.