Apparatus and process for washing wafers,申请号US19920910920-传众专利搜索

Apparatus and process for washing wafers

申请公布号：US5292373(A)

申请号：US19920910920

申请日期：1992.07.09

申请公布日期：1994.03.08

申请人：

MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

发明人：ARITA, NAOMI;DANSUI, YOSHITAKA

分类号：H01L21/304;H01L21/00;H01L21/306;(IPC1-7):H01L21/306;B08B3/08

主分类号：H01L21/304

摘要：An apparatus for washing a wafer, having a wafer-washing tank holding a washing liquid and receiving a wafer, a washing-liquid inlet provided in a first part of the sidewall of the tank, a washing-liquid outlet provided in a second part of the sidewall of the tank opposite to the first part of the sidewall, and a device holding the wafer in the tank so that the wafer is parallel to the level of the washing liquid when the wafer is immersed into or positioned in the washing liquid in the tank, and a device producing an essentially horizontal flow of the washing liquid in the tank. A process for washing a wafer, having the steps of producing a horizontal flow of the washing liquid in the tank, immersing a wafer cassette holding the wafer into the washing liquid in the tank so that the wafer is parallel to the level of the washing liquid in the tank, and subsequently positioning the cassette in the washing liquid in the tank so that the wafer is parallel to the level of the washing liquid in the tank. No free particulates which have detached from the back surface of either of adjacent wafers pollute the other wafer.