CHARGED PARTICLE BEAM ADJUSTER,申请号JP19900236949-传众专利搜索

CHARGED PARTICLE BEAM ADJUSTER

申请公布号：JPH04118843(A)

申请号：JP19900236949

申请日期：1990.09.10

申请公布日期：1992.04.20

申请人：

HITACHI MEDICAL CORP

发明人：SUGIYAMA KATSUYA;KURODA KATSUHIRO;NISHIMURA MASATOSHI

分类号：G01T1/29;H01J37/04;H05H7/00

主分类号：G01T1/29

摘要：PURPOSE:To enable measurement with high accuracy of the emittance of a charged particle beam by measuring the beam diameter at a plurality of points on a beam path and determining the emittance directly from the measured values. CONSTITUTION:A luminescent material 2 is fixed at a certain position on a beam path 1 by use of a signal from a caluculator 7, and the beam image at that position is photographed by means of a camera 5, and then the beam image is inputted into an image processor 6. In the image processor 6, a center position of the beam and the diameter thereof are determined from the beam image thus inputted, these data being sent into the calculator 7 and thus stored therein. In the same manner, the beam center-position and beam diameter at three points on the beam path 1 are stored in the calculator 7. Since measurement of the beam emittance is possible from the beam diameter values at the three points on the beam path, it is possible to determine the beam emittance from the beam diameter values at the three points which are stored in the calculator 7.