MANUFACTURE OF ELECTROOPTICAL DEVICE,申请号JP19900005248-传众专利搜索

MANUFACTURE OF ELECTROOPTICAL DEVICE

申请公布号：JPH03209439(A)

申请号：JP19900005248

申请日期：1990.01.12

申请公布日期：1991.09.12

申请人：

SEIKO INSTR INC

发明人：KURODA YOSHIKI

分类号：G02F1/136;G02F1/1365;H01L49/02

主分类号：G02F1/136

摘要：<p>PURPOSE:To uniformize picture display by controlling the amount of reactive gas corresponding to a resistance value from the terminal part of a wiring electrode, executing reactive sputtering and accumulating a base material. CONSTITUTION:A transparent substrate 21 is made of normal glass such as soda glass, etc., and a transparent picture element electrode 22 is deposited on the whole surface of the transparent substrate 21. A wiring electrode 24 is composed of an amorphas material with silicone as a main component and using the target of silicon monocrystal or silicon multicrystal and algon gas including nitrogen gas, a silicon nitriding film almost not including hydrogen is deposited according to a reactive sputtering method by a longitudinal passage type magnetron sputtering device. In such a case, with the silicon as the target, the amount of the reactive gas is controlled corresponding to the resistance value from the terminal part of the wiring electrode 24, the reactive sputtering is executed and a base a-Si material is deposited. Thus, the picture display is made uniform.</p>