Process for the removal of nitrogen oxides and sulphur oxides from flue gases
申请公布号:US4781902(A)
申请号:US19860924621
申请日期:1986.10.29
申请公布日期:1988.11.01
发明人:SCHOUBYE, PETER C. S.
分类号:B01D53/00;B01D53/34;B01D53/75;B01D53/86;C01B17/74;C01B17/79;(IPC1-7):B01J8/00;C01B17/00;C01B21/00
主分类号:B01D53/00
摘要:The invention relates to a process for eliminating nitrogen oxides and sulphur oxides from a stream of flue gas containing nitrogen oxides and sulphur oxides comprising the steps of (a) adding ammonia to the stream of flue gas and contacting the resulting stream, at a temperature of 250 DEG -450 DEG C., with a reduction catalyst for selective reduction of nitrogen oxides into nitrogen and water, the molar ratio of ammonia to nitrogen oxides being in the range of 0.6-1.8, (b) contacting the stream from step (a), at a temperature of 300 DEG -470 DEG C., with an oxidation catalyst for oxidation of unreacted ammonia into nitrogen and water and simultaneous oxidation of sulphur dioxide into sulphur trioxide, and (c) cooling the stream from step (b) for condensation of sulphur trioxide in the form of sulphuric acid. The products of the process of the invention are steam, nitrogen, and concentrated sulphuric acid of commercial quality giving no waste disposal problems.
POWER REDUCTION IN DELTA-SIGMA MODULATOR
CIRCUIT FOR INCREASING VOLTAGE SWING OF A LOCAL OSCILLATOR WAVEFORM SIGNAL
ORGANIC LIGHT-EMITTING DIODE (OLED) DISPLAY
CHIP SCALE SENSING CHIP PACKAGE AND A MANUFACTURING METHOD THEREOF
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
SEMICONDUCTOR DEVICES INCLUDING INCREASED AREA CONTACTS
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
PACKAGE SUBSTRATE AND PACKAGE STRUCTURE USING THE SAME
CHIP PACKAGE ASSEMBLY AND MANUFACTURING METHOD THEREOF
NANOSTRUCTURED CHIP AND METHOD OF PRODUCING THE SAME
SEMICONDUCTOR DEVICE HAVING BURIED WORDLINES
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Epitaxial Growth of Doped Film for Source and Drain Regions
SELF-ALIGNED SEMICONDUCTOR FABRICATION WITH FOSSE FEATURES
SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS
SUBSTRATE TRANSFER METHOD AND SUBSTRATE PROCESSING APPARATUS