DRY PROCESSING DEVICE,申请号JP19860218323-传众专利搜索

DRY PROCESSING DEVICE

申请公布号：JPS6373627(A)

申请号：JP19860218323

申请日期：1986.09.17

申请公布日期：1988.04.04

申请人：

FUJITSU LTD

发明人：KOMATSUBARA SATOO

分类号：B08B7/00;G03F7/00;G03F7/30;H01L21/027;H01L21/30;H01L21/304

主分类号：B08B7/00

摘要：PURPOSE:To contrive accomplishment of highly efficient and uniform dry process by a method wherein the ultraviolet rays directing to the ceiling surface and the circumferential wall surface of the title device are utilized in the dry process by reflecting them to a sample using a reflecting plate. CONSTITUTION:The reflecting plates 21, 22 and 23 provided on the ceiling surface 11 and the circumferential wall surface 12 of a sample chamber 7 are constituted in such a manner that quadrangular pyramid-shaped protruding parts are arranged in line on them, and ultraviolet rays sent from a lamp 10 are reflected so that they are directed to a wafer 1. For example, the ultraviolet rays coming from the lamp 10 are used as the reflection ultraviolet rays 25 directed to the wafer 1 by reflecting them with a reflecting plate, and reflection ultraviolet rays 27 directing to the wafer 1 are formed by reflecting the ultraviolet rays 26 using the reflecting plate 22. Also, among the reflection light reflected by the reflecting plates 21-23, there is reflection light going to the wafer 1 by the reflection made on the other reflecting plate. Accordingly, the coefficient of utilization of the quantity of light of the ultraviolet rays to be used for a resist stripping is high, and the resist stripping can be completed in a short period. Also the illuminance on the wafer 1 can be equalized, the resist stripping makes progress on each part at the same speed, and also it can be performed uniformly without generation of irregularity.