A DEVELOPER SOLUTION FOR POSITIVE-WORKING PHOTORESIST COMPOSITIONS
申请公布号:GB2193335(A)
申请号:GB19870015459
申请日期:1987.07.01
申请公布日期:1988.02.03
发明人:HATSUYUKI * TANAKA;YOSHIYUKI * SATO;HIDEKATSU * KOHARA;TOSHIMASA * NAKAYAMA
分类号:G03C1/72;G03F7/00;G03F7/30;G03F7/32;H01L21/027;H01L21/30;(IPC1-7):G03F7/26
主分类号:G03C1/72